Through the NADA EXPO&CLEAN software operating interface, the Loader sends the wafer to the Exposure, controls the X, Y, Z, and T axis positioning of the mechanical movement of the exposure machine, and the image recognition system OCR, adjusts the wafer to the exposure position, and accurately controls the time through the program system / Energy exposure time, expose the photoresist layer on the wafer under the mask at a specified angle. After the exposure is completed, the wafer is automatically transmitted to the downstream cleaning machine through upstream and downstream signal transmission, and the software controls the mechanical actions and valves. Use photoresist removal solution to clean the photoresist layer on the wafer. The cleaned wafer is automatically sent back to the Unloader Track machine by the Robot transfer system.